1 AIT Asian Institute of Technology

Study of anisotropic particles for chemical mechanical polishing

AuthorSupaporn Leungsuree
Call NumberAIT Thesis no.ME-09-08
Subject(s)Nanoparticles
Hard disks (Computer science)

NoteA thesis submitted in partial fulfillment of the requirements for the degree of Master of Engineering in Microelectronics, School of Engineering and Technology
PublisherAsian Institute of Technology
Series StatementThesis ; no. ME-09-08
AbstractNOTE 520 Chemical Mechanical Planarization (CMP) is one of the important processes in semiconductor and had disk drive manufacturing. It can create flat and smooth surface which is one of the requirement to build up multi-layer of devices. Slurry is one of the components in CMP process, it is the medium between the film and CMP pad and it helps to etch out the material. One of the most popular slurry for CMP is silica in spherical shape which can be synthesized by Stoeber method. There is motivation to develop slurry in anisotropic shape to compare CMP performance. ZnO was selected among other material due to the existing knowing of synthesis by hydrothermal growth, the process itself is relatively simple among other processes and it can offer the modulation of morphology and nanostructure. Silica capping on ZnO particles were introduced in this study to improve material properties to optimize CMP performance. In this study, two types of particles, silica slurry and ZnO coated with silica, were synthesized and characterized. Then slurries were developed from the particles in order to compare CMP performance.
Year2009
Corresponding Series Added EntryAsian Institute of Technology. Thesis ; no. ME-09-08
TypeThesis
SchoolSchool of Engineering and Technology (SET)
DepartmentDepartment of Industrial Systems Engineering (DISE)
Academic Program/FoSMicroelectronics (ME)
Chairperson(s)Dutta, Joydeep
Examination Committee(s)Chanchana Thanachayanont;Krisda Siangcheaw
Scholarship Donor(s)Western Digital (Thailand) Co.,Ltd.;NECTEC;Asian Institute of Technology Fellowship
DegreeThesis (M.Eng.) - Asian Institute of Technology, 2009


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