| Author | Punnuttha Pinkaew |
| Note | A thesis submitted in partial fulfillment of the requirements for the
degree of Master of Science in Mechatronics, School of Engineering and Technology |
| Publisher | Asian Institute of Technology |
| Abstract | The cavity wall angle from Ion Milling etched of Al2O3-TiC had low angle from low etch depth below 1000 nm. The cavity wall angle is one parameter contribute to fly height of slider head. This study proposes to optimize wall angle in slider head fabrication to achieve minimum 25 degree target of cavity wall angle. OFAT is first step to select significant parameters which affect to wall angle. The OFAT result shows 3 significant parameters at photo resist thickness, Incidence angle of Ion milling etched and etch depth target are affect to wall angle. Design of experiment (DOE) with full factorial used to analyze main effect and optimized to achieve target at lowest etch depth target 737 nm. The best setting parameters to achieve 25 degree minimum of cavity wall angle and no etching defect is photo resist thickness at 6 um and incidence angle at 105 degree. The results from this experiment are useful for further development to improve cavity wall angle in slider head fabrication process. |
| Year | 2015 |
| Type | Thesis |
| School | School of Engineering and Technology (SET) |
| Department | Department of Industrial Systems Engineering (DISE) |
| Academic Program/FoS | Microelectronics (ME) |
| Chairperson(s) | Bohez, Erik L. J.; |
| Examination Committee(s) | Mongkol Ekpanyapong;Peerapol Boonyuen;Pakawat Suaysuwan; |
| Scholarship Donor(s) | Western Digital ;NECTEC, Thailand ;AIT Fellowship; |